Contact Details
- Email: jin@ochitest.com
- Phone: +86 18921375901
Silica Polishing Liquid
Water-based colloidal silica polishing fluid for ultra-fine polishing of metallographic samples, precision parts, optical components and semiconductor wafers. Uniform particle size, scratch-free finish, stable dispersion, suitable for final mirror polishing of various materials.
Silica Dioxide Polishing Suspension is a professional water-based ultra-fine polishing consumable, formulated with high-purity colloidal silicon dioxide as the main polishing abrasive. It features uniform and controllable particle size distribution, good suspension stability, and no agglomeration during long-term use. This polishing fluid is specially designed for final mirror polishing after fine grinding, effectively removing surface deformation layers and fine scratches, achieving a smooth, scratch-free mirror surface required for metallographic microstructure observation, material detection and precision surface treatment. It is neutral, non-corrosive, low-odor, easy to clean with no residual residue, and widely compatible with standard metallographic polishing machines and manual polishing operations.
2. Core Advantages
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Uniform Colloidal Silica Particles: Strictly controlled particle size, no coarse particles, effectively avoids surface scratches and ensures consistent polishing effect for every sample.
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Stable Water-Based Suspension: Good dispersion performance, no sedimentation or agglomeration after long-term storage, easy to dilute and adjust concentration according to polishing needs.
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Scratch-Free Mirror Polishing: Ideal for final finishing of metallographic samples, eliminates fine polishing marks and deformation layers, enabling clear metallographic structure observation under microscope.
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Neutral & Non-Corrosive: Mild formula, no damage to metal samples, alloy surfaces, polishing cloths or machine parts, safe for daily laboratory use.
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Easy to Clean & Low Residue: Water-soluble formula, quick to rinse with clean water after polishing, no sticky residue left on sample surface or polishing pad.
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Wide Material Compatibility: Suitable for polishing various metals, alloys, stainless steel, copper, aluminum, ceramics, semiconductor wafers, optical glass and electronic components.
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Ready-to-Use: No complicated preparation required, can be directly used for automatic or manual polishing, improving work efficiency.
3. Technical Parameters
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Item
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Specification
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Product Name
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Silica Dioxide Polishing Suspension
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Main Component
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Colloidal Silicon Dioxide (SiO₂)
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Particle Size Range
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20nm, 50nm, 80nm, 100nm, 200nm (optional)
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Formula Type
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Water-based neutral suspension
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pH Value
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Neutral (6.5-7.5)
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Solid Content
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20%-40% (customizable)
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Standard Packaging
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500ml / 1L / 5L bottle
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Appearance
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Translucent milky white liquid, no agglomeration
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Shelf Life
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12 months (sealed storage)
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Application
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Metallographic mirror polishing, precision parts polishing, optical & semiconductor polishing
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4. Application Scenarios
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Metallographic Laboratory: Final mirror polishing of metal samples for microstructure, grain size and inclusion analysis
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Precision Manufacturing: Surface polishing of precision molds, bearings, cutting tools and hardware accessories
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Electronic & Semiconductor: Polishing of wafers, ceramic components and electronic precision parts
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Optical Industry: Fine polishing of optical glass, lenses and transparent precision parts
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Material Research: Surface treatment of various alloys, non-ferrous metals and special materials
